Dnq stands for diazonaphthoquinone, a lightsensitive compound that in its unexposed form interacts with a cresolformaldehyde resin, the novolak, to make a product that is insoluble in aqueous alkaline developer solution. Read mechanism of the trefonas effect polyphotolysis in dissolution inhibition resists, proceedings of spie on deepdyve, the largest online rental service for scholarly research with thousands of academic publications available at your fingertips. The term novolak is derived from the swedish work lak, meaning lacquer or resin, prefixed by latin or italian novo, meaning new. Abstract the effects of the natural compound 2methoxy1,4naphthoquinone, isolated from the leaves of impatiens glandulifera and the synthetic compounds 2propoxy1,4naphthoquinone and 2isopropoxy1,4naphthoquinone on ecdysone 20monooxygenase. Department of transportation federal aviation administration. Hoechst ag merged with clariant ag of switzerland hoechst ag, undated. In the unexposed regions of the resist film, the dnq acts as a dissolution inhibitor and. Definition of diazonaphthoquinone in the dictionary. Before sharing sensitive information, make sure youre on a federal government site.
There is information of nmethyl2pyrroridone in the material safety data sheet of supplier. When exposed, diazonaphthoquinone dnq novolakbased thickfilm positive resist hereafter thickfilm resist decomposes into indene ketene, producing. Diazonaphthoquinone is listed in the worlds largest and most authoritative dictionary database of abbreviations and acronyms. On the other hand, curable siliconebased materials, such as polydimethylsiloxane pdms, is commonly used to fabricate superhydrophobic surfaces because of its low surface energy. Jcprc5 1289 synthesis and characteristics of amino acid derivatives of 1,4naphthoquinone oksana figurka a, viktoriia kochubei a, semen khomyak a, mykola platonov b. Fabrication of robust pdms microstructure with hydrophobic. Pdms also provides a conformal contact and it is easy release from a silicon master mold. There are three basic ingredients to all commercial dnqnovolac photoresists. Improved resolution of thick film resist effect of pre. Sep 03, 2018 naphthoquinone countable and uncountable, plural naphthoquinones organic chemistry either of two isomers of polycyclic aromatic ketones derived from naphthalene.
Embelia is a genus of myrsinaceae consisting of approximately 30 species 1. Mechanism of the trefonas effect polyphotolysis in. The following solvents was used in the cyclicvoltammetric experiments. Being submerged in seawater, surfaces of a ship hull are exposed to thousands of species of fouling organisms that cause an increase in ship hull drag, fuel. Diazonaphthoquinone based resists tutorial texts in optical engineering. Diazonaphthoquinone dnq is a diazo derivative of naphthoquinone. The exposed regions of the photoresist film become soluble in aqueous base. Click download or read online button to get diazonaphthoquinone based resists book now.
Nomination summary for diazonaphthoquinone compounds n20220. Novolakdiazonaphthoquinone dnq resists are photosensitive varnishes that are used in the fabrication of more than 80% of todays integrated circuits. Focus also is placed on the chemical basis of applicationrelated facets of the lithographic process. They have played a crucial role in an unprecedented technical revolution, yet until quite recently nobody really knew how they work. Molecular modeling of the thermal decomposition of polymers october 2005 final report this document is available to the u. Polyphotolysis is an important aspect ofnovo1akdiazonaphthoquinone resists. Biofouling on surfaces, such as marine infrastructure, medical devices, and other engineering components, has been a global issue with significant impact on economic situation, fuel consumption, and health risks 1,2.
Society of photooptical instrumentation engineers, this book elucidates the reasons underlying the lasting success of dnqn resist systems by examining the correlation between the chemical structure of the components and the photoresist performance. Embelia schimperi vatke is a shrub that grows in mount oku and mount mwanengouba in cameroon 2, 3. Most of those reported so far have been based on a contrast. Evidence for the production of hydroxyl radicals from the adriamycin semiquinone and hzoz christine c. Pdf thick photoresist films continue to play an important role in many. Mack, finle technologies, austin, texas there are a large number of materials, both organic and inorganic, which are sensitive to light see, for example, ref.
These new lacquers were indeed first used as such, as a synthetic ersatz for natural kopal resins from sansibar, the congo, or the philippines, which were used in paints. Sodium 1,2naphthoquinone2diazide5sulfonate 2657003. Dnq compounds, 1naphthalenesulfonic acid, 6diazo5,6dihydro5oxo. Viscosity affects the flow characteristics and film thickness, and depends on the. The molecular mechanism of novolakdiazonaphthoquinone resists. To date the bulk of these aromatics derived from naphthais based petrochemistry. However, over the years one specific class of photosensitive materials has been. Hybrid models combining the csda with the moller and vriens cross sections have also.
So, it works for all operating systems including mac, windows, and linux. S1 supporting information redoxactive conjugated microporous polymers. Diazonaphthoquinone what does diazonaphthoquinone stand for. Organic synthesis is a special branch of chemical synthesis and is concerned with the intentional construction of organic compounds. Holograms recording with pulsed laser on diazonaphthoquinonenovolacbased photoresists and their nanocomposites. Chemical formula synonyms cas number ac2o3 actiniumiii oxide agbf4 silver tetrafluoroborate 14104202 agbr silver bromide 7785231 agbro3 silver bromate 7783893. Extreme high moderate low section 1 chemical product and company identification product name 1,4benzoquinone statement of hazardous nature considered a hazardous substance according to osha 29 cfr 1910. The condensation of 2,3,4trihydroxybenzophenone with diazonaphthoquinone sulfonyl chloride in dimethylacetamide or nmethyl2pyrrolidone resulted in a diester isomer distribution that was different than that observed in acetone, 1,4dioxane, methyl ethyl ketone, tetrahydrofuran and gammabutyrolactone. Search the leading research in optics and photonics applied research from spie journals, conference proceedings and presentations, and ebooks. Soda pdf merge tool allows you to combine two or more documents into a single pdf file for free. Effects of the compounds 2methoxynaphthoquinone, 2. Photoresist key properties photospeed is determined by the quantum efficiency of the resist, i. Diazonaphthoquinone based resists by ralph dammel, 9780819410191, available at book depository with free delivery worldwide.
This site is like a library, use search box in the widget to get ebook that you want. In a typical synthesis, a diazonaphthoquinone dnq sulfonyl chloride is added to a phenolic compound with an amine catalyst. Mechanism of the trefonas effect polyphotolysis in dissolution inhibition resists mechanism of the trefonas effect polyphotolysis in dissolution inhibition resists han, yukai. The crystal structure of pkh2me pkh 2,3dihydroxyphenzine1,4dione which is a precursor to the ptk2me intermediate shows the coh bonds are shortened due to the partial double bond. Diazonaphthoquinone5sulfonate composition variants.
In this way, dnq has become an important reagent in photoresist technology. Pdf solvent content of thick photoresist films researchgate. Synthesis of naphthoquinone derivatives with potential. Synthesis of diazonaphthoquinone dnq photoactive compounds. Diazonaphthoquinonebased resists tutorial texts in optical. Upon exposure to light, dnq converts to a derivative that is susceptible to etching. Coquinone contains a hydrosoluble form of coenzyme q 10 coq 10 that is 2. In teratogenic studies of rats with nmethyl2pyrroridone by dermal application, material toxicity was found by reduced body weight gain during gestation.
Advances in the design of organic resist materials. Synthesis, antioxidant and cytotoxic activities of novel. Diazonaphthoquinonebased resists tutorial texts in. Information and translations of diazonaphthoquinone in the most comprehensive dictionary definitions resource on the web. Introduction the antitumour activity of adriamycin doxorubi. The stem of embelia schimperi was collected at mount. The basic chemistry of both dnq sensitizers and novolak resins are explored. Also, fewer live fetuses per dam, an increase in the percentage of. Improved resolution of thick film resist effect of prebake. Journal of chemical and pharmaceutical research, 2015, 74. The photoactive compound pac and an amine salt are formed. Willson calixarenes carboxylic acid cations chem chemical chemistry compounds contrast cresol crosslinking deprotonation diazonaphthoquinone diffusion channels dissolution inhibition dissolution rate dnq moieties dnq resists dnqnovolak resists dnqnovolak systems dry etch ebeam effect energy ester esterification. In this way, dnq has become an important reagent in photoresist technology in the semiconductor industry.
Winterbourn department of clinical biochemistry, christchurch hospital, christchurch, new zealand received 5 october 198 1 1. Click more options, then select the based on file names or based on document titles options in the table of. Diazonaphthoquinonebased resists tutorial texts in optical engineering ralph dammel on. Hence, in the present study, we investigated the electrochemical reduction behaviour of naphthoquinone and substituted naphthoquinones in nonaqueous solvents. This book elucidates the reasons underlying the lasting success of dnqn resist systems by examining the correlation between the chemical structure of the components and the photoresist performance. The condensation of 2,3,4trihydroxybenzophenone with diazonaphthoquinone sulfonyl chloride in dimethylacetamide or nmethyl2pyrrolidone resulted in a diester isomer distribution that was different than that observed in acetone, 1,4dioxane, methyl ethyl. Dammel, diazonaphthoquinonebased resists, spie optical. Diazonaphthoquinone based resists tutorial texts in optical engineering ralph dammel on. When exposed, diazonaphthoquinone dnq novolak based thickfilm positive resist hereafter thickfilm resist decomposes into indene ketene, producing. However, recent progress in the fermentative production of metabolites using renewable resources and engineered microbes has enabled the production of bioprecursors, such as 4amino benzoic acid paba and 2amino benzoic acid oaba. Looking for online definition of diazonaphthoquinone or what diazonaphthoquinone stands for. Molecular modeling of the thermal decomposition of polymers. Nomination summary for diazonaphthoquinone compounds.
The higher blood levels of coq 10 supplied enhance mitochondrial production of atp. Diazonaphthoquinone based resists download ebook pdf. It makes for higher lighograpbic contrast and leads to higher line resolution. Structure, properties, spectra, suppliers and links for. The resist materials used in the fabrication of semiconductor. Abstract there is a continuing need to prepare pacs with less ionic impurities. There are several main areas of research within the general area of organic synthesis. Molecular glass photoresists have attracted increasing attention as nextgeneration replacements for traditional polymeric resists.
Diazonaphthoquinonebased resists tutorial texts in optical engineering. Diazonaphthoquinone derivatives used in photoresists. Organic molecules are often more complex than inorganic compounds, and their synthesis has developed into one of the most important branches of organic chemistry. Diazonaphthoquinonebased resists by ralph dammel, 9780819410191, available at book depository with free delivery worldwide. A new cytotoxic alkenylresorcinol from embelia schimperi. Diazonaphthoquinone what does diazonaphthoquinone stand. For example, hanabata and coworkers 610 have used fractionation to optimize the performance of highresolution resists based on diazonaphthoquinone dnq pacs. Novolak diazonaphthoquinone dnq resists are photosensitive varnishes that are used in the fabrication of more than 80% of todays integrated circuits. Nomination summary for nomination summary for diazonaphthoquinone compounds n20220 nomination summary for diazonaphthoquinone compounds n20220 nominated substances. Pdf merge combinejoin pdf files online for free soda pdf.